Our equipment is specialized on fabrication and analyzation of nanometer sized metallic structures. Please find further information on the following detail pages:
- Cryostats for various measurement shemes
- Thin film deposition machines
- AFMs and MFMs
- SEM
Further devices are located in the shared Nanolab facility:
- Zeiss CrossBeam 1540XB: E-Beam Lithography and FIB Milling
- Karl Süss MJB 3 Mask Aligner: Optical Lithography
- Sentech SI 220: Reactive Ion Etching
- tpt Wire Bonder HB06
- nanofilm Ellipsometer EP3
- Bal-Tec CPD 030 Critical Point Dryer
- Chemical Hoods
A full list of the available equipment in the Nanolab can be found on the Nanolab website.